材料期刊网

H-plasma In-situ Cleaning and Lattice Damage Elimination

Chenguang GONG+ , Fuchu SHEN , Biguang YE , Jian CHEN , Zhenjiang University , Hangzhou , 310027 , China

材料科学技术（英）

This article discusses the silicon lattice damage induced during H-plasma in-situ cleaning and finds that the substrate temperature, plasma power, processing time, all affect the extent of the distortion of the surface and its curability.

关键词: H-plasma cleaning , null , null , null